The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Dec. 06, 2012
Hitachi High-tech Science Corporation, Tokyo, JP;
Ikuko Nakatani, Tokyo, JP;
Abstract
A FIB is irradiated onto a sample to form a lamella whose upper side has a thickness of 100 nm or less and whose lower side has a thickness greater than that of the upper side. First and second measurement regions are set on an observation image of the lamella on the upper and lower sides, respectively, where the lamella is thin enough to transmit therethrough an EB. An EB is irradiated onto the first and second measurement regions and charged particles generated therefrom are detected, and a slant angle of one degree or smaller is calculated based on the detected amount of charged particles generated from the first and second measurement regions and the distance between the two regions. The lamella is slanted with respect to the FIB and then irradiated by the FIB by the calculated slant angle to uniformize the thickness of the lamella to a value of 100 nm or smaller.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile