The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2017

Filed:

Apr. 14, 2014
Applicant:

Honeywell International Inc., Morristown, NJ (US);

Inventors:

Mohammed Ibrahim Mohideen, Karnataka, IN;

Madhukar Madhavamurthy Gundappa, Karnataka, IN;

Mahesh Gellaboina, Andhra Pradesh, IN;

Viswanath Talasila, Karnataka, IN;

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 3/12 (2006.01); G05B 13/04 (2006.01); G05B 17/02 (2006.01); F23G 5/50 (2006.01); F23G 7/08 (2006.01);
U.S. Cl.
CPC ...
G05B 13/048 (2013.01); F23G 5/50 (2013.01); F23G 7/08 (2013.01); G05B 17/02 (2013.01); F23J 2900/11002 (2013.01); F23N 2023/40 (2013.01); F23N 2023/44 (2013.01); F23N 2029/20 (2013.01);
Abstract

A method of reducing plant emissions includes providing a MPC model for a flaring process including one-to-one models between controlled variables (CVs) including a smoke count and/or a flare count (CV) and a noise level (CV), and flow of assist gas as a manipulated variable (MV) and another process gas flow as a disturbance variable (DV). The MPC model receives sensed flare-related parameters during the flaring process including a measure of CV(CV*) and CV(CV*). Provided CV* is above a minimum setpoint for CV(CVsetpoint) and CV* is above a setpoint for CV(CVsetpoint), the flaring process is automatically controlled using the MPC model which determines an updated flow setpoint for MV from CV* and CV*, the CVand CVerror, and the identified one-to-one models.


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