The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2017

Filed:

May. 15, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Takashi Ogura, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7007 (2013.01); G03F 7/70141 (2013.01);
Abstract

The exposure apparatus includes a first detector, a first alignment unit, a second detector, and a second alignment unit, and a controller, wherein the controller controls the second alignment unit so that alignment of a substrate is conducted based on a detection result from detection of the mark by the second detector in a first view when alignment of the substrate can be conducted by the first alignment unit at a prescribed alignment accuracy, and controls the second alignment unit so that alignment of the substrate is conducted based on a detection result from detection of the mark by the second detector in a second view that is wider than the first view when alignment of the substrate cannot be conducted by the first alignment unit at the prescribed alignment accuracy.


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