The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Mar. 24, 2015
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Seung Won Park, Seoul, KR;
Tae Woo Kim, Seoul, KR;
Dae Ho Yoon, Hwaseong-si, KR;
Moon Gyu Lee, Suwon-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A method of fabricating a polarizer, the method including, forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area which are spatially separated from each other, forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer, forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a mask, and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area.