The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Aug. 21, 2012
Hikaru Hanada, Tokyo, JP;
Kuniharu Oka, Tokyo, JP;
Masaharu Ono, Tokyo, JP;
Masahiro Takizawa, Tokyo, JP;
Hikaru Hanada, Tokyo, JP;
Kuniharu Oka, Tokyo, JP;
Masaharu Ono, Tokyo, JP;
Masahiro Takizawa, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
In order to obtain a high-quality image even in multi-slice imaging in a UTE sequence that uses a half RF pulse, a refocusing pulse of the slice gradient magnetic field is adjusted and applied so that the excitation profiles of positive polarity data and negative polarity data have phase distributions that are 180 [deg] inverted with respect to each other in side lobe portions. In addition, the irradiation frequency of the half RF pulse is adjusted so as to eliminate a position shift between the intensity distributions of the positive polarity data and the negative polarity data.