The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2017

Filed:

Jun. 28, 2011
Applicants:

Kenji Nakanishi, Tokyo, JP;

Hiroyuki Itagaki, Tokyo, JP;

Inventors:

Kenji Nakanishi, Tokyo, JP;

Hiroyuki Itagaki, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/54 (2006.01); G06F 17/11 (2006.01); G01R 33/561 (2006.01); G01R 33/565 (2006.01);
U.S. Cl.
CPC ...
G01R 33/543 (2013.01); G01R 33/565 (2013.01); G01R 33/5613 (2013.01); G06F 17/11 (2013.01);
Abstract

Disclosed are a magnetic resonance imaging apparatus and an RF pulse control method wherein an RF pulse sequence in a start-up sequence is set as a monotonically increasing flip angle with offset, in order to reduce ghosts, blurring, and other artifacts during measurement in a transient state. For example, the sum of two adjacent consecutive terms in a monotonically increasing sequence is set as the flip angle. Specifically, the number of RF pulses in the RF pulse sequence and the flip angle for the RF pulses in an SSFP sequence are set, and the monotonically increasing flip angle with offset is found, based on the set number of RF pulses in the RF pulse sequence and the flip angle for the RF pulses in the SSFP sequence, and used as the RF pulse sequence.


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