The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
May. 30, 2014
Applicant:
Pall Corporation, Port Washington, NY (US);
Inventors:
Khaled Abdel-Hakim Helmy Aamer, Port Washington, NY (US);
Selina Shi, Levittown, NY (US);
Assignee:
Pall Corporation, Port Washington, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 71/80 (2006.01); B01D 69/10 (2006.01); B05D 1/00 (2006.01); B01D 71/62 (2006.01); C08G 61/12 (2006.01); C09D 153/00 (2006.01); C08J 9/00 (2006.01);
U.S. Cl.
CPC ...
C08J 9/00 (2013.01); B01D 71/62 (2013.01); B01D 71/80 (2013.01); B05D 1/005 (2013.01); C08G 61/12 (2013.01); C09D 153/00 (2013.01); C08G 2261/126 (2013.01); C08G 2261/1412 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/3342 (2013.01); C08G 2261/418 (2013.01); C08G 2261/614 (2013.01); C08J 2205/042 (2013.01); C08J 2353/00 (2013.01); Y10T 428/249953 (2015.04);
Abstract
Disclosed are self-assembled structures formed from a self-assembling diblock copolymer of the formula (I): wherein R-R, n, and m are as described herein, which find use in preparing porous membranes. In an embodiment, the diblock copolymer is present in the self-assembled structures in a cylindrical morphology. Also disclosed is a method of preparing a self-assembled structure, which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film.