The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Oct. 13, 2015
Applicant:
Fina Technology, Inc., Houston, TX (US);
Inventors:
Wei Wang, League City, TX (US);
David Knoeppel, League City, TX (US);
Madison Bluhm, Houston, TX (US);
Assignee:
Fina Technology, Inc., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 112/00 (2006.01); C08F 112/08 (2006.01); C08J 3/24 (2006.01); C08F 2/38 (2006.01); C08F 2/40 (2006.01); C08F 279/02 (2006.01); C08F 6/00 (2006.01);
U.S. Cl.
CPC ...
C08F 112/08 (2013.01); C08F 2/38 (2013.01); C08F 2/40 (2013.01); C08F 6/001 (2013.01); C08F 279/02 (2013.01); C08J 3/24 (2013.01); C08J 2325/06 (2013.01);
Abstract
The method includes providing a high impact polystyrene (HIPS) reaction system, wherein the HIPS reaction system has a devolitalizer downstream of a reactor and injecting a retarding agent into the HIPS reaction system prior to the devolitalizer.