The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2017

Filed:

Jun. 11, 2015
Applicants:

Opel Solar, Inc., Storrs Mansfield, CT (US);

The University of Connecticut, Farmington, CT (US);

Inventor:

Geoff W. Taylor, Mansfield, CT (US);

Assignees:

Opel Solar, Inc., Mansfield, CT (US);

THE UNIVERSITY OF CONNECTICUT, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 31/102 (2006.01); H01L 21/02 (2006.01); H01L 21/70 (2006.01); H01L 33/00 (2010.01); H01L 33/02 (2010.01); H01L 33/04 (2010.01);
U.S. Cl.
CPC ...
H01L 33/0062 (2013.01); H01L 33/0025 (2013.01); H01L 33/0041 (2013.01); H01L 33/025 (2013.01); H01L 33/04 (2013.01);
Abstract

A semiconductor device includes a series of layers formed on a substrate, including a first plurality of n-type layers, a second plurality of layers that form a p-type modulation doped quantum well structure (MDQWS), a third plurality of layers disposed between the p-type MDQWS and a fourth plurality of layers that form an n-type MDQWS, and a fifth plurality of p-type layers. The first plurality of layers includes a first etch stop layer of n-type formed on an n-type contact layer. The third plurality of layers includes a second etch stop layer formed above the p-type MDQWS and a third etch stop layer formed above and offset from the second etch stop layer. The fifth plurality of layers includes a fourth etch stop layer of p-type formed above the n-type MDQWS and a fifth etch stop layer of p-type doping formed above and offset from the fourth etch stop layer.


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