The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2017

Filed:

Sep. 23, 2015
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Shinpei Watanabe, Tokyo, JP;

Shinichi Uchida, Tokyo, JP;

Tadashi Maeda, Tokyo, JP;

Kazuo Henmi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/522 (2006.01); H01L 23/31 (2006.01); H01L 23/495 (2006.01); H01L 23/528 (2006.01); H01L 25/065 (2006.01); H04B 5/00 (2006.01); H01F 38/14 (2006.01); H01L 23/48 (2006.01); H01L 23/00 (2006.01); H01L 25/16 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5227 (2013.01); H01F 38/14 (2013.01); H01L 23/3107 (2013.01); H01L 23/48 (2013.01); H01L 23/49575 (2013.01); H01L 23/528 (2013.01); H01L 24/05 (2013.01); H01L 24/73 (2013.01); H01L 25/0657 (2013.01); H01L 25/16 (2013.01); H01L 25/162 (2013.01); H04B 5/0031 (2013.01); H04B 5/0081 (2013.01); H01L 2224/02166 (2013.01); H01L 2224/04042 (2013.01); H01L 2224/05554 (2013.01); H01L 2224/32145 (2013.01); H01L 2224/32245 (2013.01); H01L 2224/45147 (2013.01); H01L 2224/48091 (2013.01); H01L 2224/48247 (2013.01); H01L 2224/48465 (2013.01); H01L 2224/49171 (2013.01); H01L 2224/73215 (2013.01); H01L 2224/73265 (2013.01); H01L 2224/92147 (2013.01); H01L 2224/92247 (2013.01); H01L 2225/06527 (2013.01); H01L 2924/13055 (2013.01); H01L 2924/181 (2013.01);
Abstract

Dielectric breakdown is prevented between opposing two semiconductor chips, to improve the reliability of a semiconductor device. A first semiconductor chip has a wiring structure including a plurality of wiring layers, a first coil formed in the wiring structure, and an insulation film formed over the wiring structure. A second semiconductor chip has a wiring structure including a plurality of wiring layers, a second coil formed over the wiring structure, and an insulation film formed over the wiring structure. The first semiconductor chip and the second semiconductor chip are stacked via an insulation sheet with the insulation film of the first semiconductor chip and the insulation film of the second semiconductor chip facing each other. The first coil and the second coil are magnetically coupled with each other. Then, in each of the first and second semiconductor chips, wires and dummy wires are formed at the uppermost-layer wiring layer.


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