logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9589788 B1

PDFFull Text
Date of Patent:
Mar. 07, 2017

Filed:

Jun. 10, 2016

Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition

Applicants:

SK Innovation Co., Ltd., Seoul, KR;

SK Global Chemical Co., Ltd., Seoul, KR;

Inventors:

Min Ho Jung, Daejeon, KR;

Jeong Eop Choi, Daejeon, KR;

Hye Ryoung Lee, Daejeon, KR;

Assignees:

SK Innovation Co., Ltd., Seoul, KR;

SK Global Chemical Co., Ltd., Seoul, KR;

Attorney:

The Webb Law Firm

Primary Examiner:

Brook Kebede

Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/02 (2006.01); C08G 8/02 (2006.01); C09D 161/16 (2006.01); H01L 21/027 (2006.01); G03F 7/11 (2006.01); C08K 5/3445 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02118 (2013.01); C08G 8/02 (2013.01); C09D 161/16 (2013.01); G03F 7/11 (2013.01); H01L 21/0274 (2013.01); H01L 21/02282 (2013.01); H01L 21/02345 (2013.01); C08G 2150/00 (2013.01); C08K 5/3445 (2013.01);
Abstract

Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, Rto R, L, and R' and R″ are the same as those in the detailed description of the present invention.

Find Patent Forward Citations

Jung, Min. (2017). Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition (U.S. Patent No. 9589788). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9589788

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…