The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Jan. 09, 2014
Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Munich, DE;
Ushio Denki Kabushiki Kaisha, Tokyo, JP;
Klaus Bergmann, Herzogenrath, DE;
Ralf Pruemmer, Geilenkirchen, DE;
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., Munich, DE;
USHIO DENKI KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention relates to a method for improving the wettability of a rotating electrode with a liquid medium in a discharge lamp, in particular for the production of EUV radiation or soft X-rays, and a correspondingly designed gas discharge lamp. In the method, the edge surface of the rotating electrode to which the liquid medium is applied is microstructured by means of external processing. This microstructure significantly improves the wettability of the edge surface for the liquid medium. Furthermore, the distribution of the liquid medium over the edge surface can be controlled selectively by suitable choice of the microstructure.