The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Jul. 30, 2015
Applicant:
Agilent Technologies, Inc., Santa Clara, CA (US);
Inventors:
Gershon Perelman, Cupertino, CA (US);
Mark Denning, San Jose, CA (US);
Mehrnoosh Vahidpour, Santa Clara, CA (US);
Guthrie Partridge, Santa Clara, CA (US);
Assignee:
Agilent Technologies, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/26 (2006.01); H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
H01J 49/00 (2013.01);
Abstract
A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.