The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Sep. 28, 2012
Leybold Optics Gmbh, Alzenau, DE;
Michael Scherer, Kahl, DE;
Jurgen Pistner, Alzenau-Michelbach, DE;
Harro Hagedorn, Frankfurt a.M., DE;
Michael Klosch-Trageser, Freigericht-Neuses, DE;
Leybold Optics GmbH, Alzenau, DE;
Abstract
The invention relates to an apparatus () for producing a reflection-reducing layer on a surface () of a plastics substrate (). The apparatus comprises a first sputtering device () for applying a base layer () to the surface () of the plastics substrate (), a plasma source () for plasma-etching the coated substrate surface (), and a second sputtering device () for applying a protective layer () to the substrate surface (). These processing devices () are arranged jointly in a vacuum chamber (), which has inlets () for processing gases. In order to move the substrate () between the processing devices () in the interior of the vacuum chamber (), a conveying apparatus () is provided which is preferably in the form of a rotary table (). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface () of the plastics substrate ().