The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2017

Filed:

May. 30, 2013
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Boong Kim, Chungcheongnam-do, KR;

Ki Bong Kim, Chungcheongnam-do, KR;

Gil Hun Song, Chungcheongnam-do, KR;

Oh Jin Kwon, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 21/12 (2006.01); F26B 5/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F26B 21/12 (2013.01); F26B 5/005 (2013.01); H01L 21/67017 (2013.01); H01L 21/67034 (2013.01);
Abstract

Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.


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