The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Apr. 18, 2013
Georgia Tech Research Corporation, Atlanta, GA (US);
Jeffery S. Hsieh, Marietta, GA (US);
Alexander T. Jordan, Broad Run, VA (US);
Daniel T. Lee, Rochester, MN (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
The disclosed technology includes systems and methods for clustering particles, especially water contaminants, by liquid-phase electric plasma discharge. According to certain implementations, the discharge may be applied continuously, and may be of relatively low power, e.g., a voltage between 300 V and 5000 V and an amperage between 0.1 A and 1 A. The electrodes introducing the electric discharge may be in a point-to-point configuration and with at least one electrode having a large aspect ratio. In some implementations, one or more of the voltage and amperage of the electric discharge, electrode configuration and aspect ratio, and the conductivity of the medium may enable the generation of plasma containing hydroxyl and other radicals. The radicals may catalyze polymerization of the particles, resulting in an increase in particle size and, thus, improved filterability. The polymerization process may continue after the electric discharge is discontinued or removed from influence of the medium.