The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Nov. 04, 2014
Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;
Hyun Sung Bang, Bucheon-si, KR;
Jae Sik Kim, Hwaseong-si, KR;
Yeon Hwa Lee, Yongin-si, KR;
Joon Gu Lee, Seoul, KR;
Ji Young Choung, Yongin-si, KR;
Jin Baek Choi, Anyang-si, KR;
Kyu Hwan Hwang, Yongin-si, KR;
Young Woo Song, Suwon-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A mask for forming an organic layer pattern, the mask including a photomask having a first substrate and a reflecting layer on the first substrate; and a donor substrate on the photomask and separated therefrom, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate.