The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Sep. 08, 2014
Xianfeng Chen, Kanagawa, JP;
Xianfeng Chen, Kanagawa, JP;
RICOH COMPANY, LTD., Tokyo, JP;
Abstract
A pattern formation method includes forming an electromagnetic wave blocking structure having a region on a one side of a support substrate, a reflectance of an electromagnetic wave in the region being lower than a reflectance in an area outside the region; forming a mask layer provided with an opening corresponding to the region and configured to be thermally decomposed at a predetermined temperature on an other side of the support substrate; forming a first heated layer in the opening; and shedding an electromagnetic wave from the one side of the support substrate on the electromagnetic wave blocking structure, wherein an intensity of the electromagnetic wave is determined such that a temperature of the mask layer is less than the predetermined temperature and a temperature of the first heated layer being heated is greater than or equal to the predetermined temperature.