The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Mar. 10, 2015
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventor:

John Morgan, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/78 (2006.01); H01L 27/092 (2006.01); H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 21/8238 (2006.01); H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7831 (2013.01); H01L 21/265 (2013.01); H01L 21/823871 (2013.01); H01L 21/823878 (2013.01); H01L 21/823892 (2013.01); H01L 21/84 (2013.01); H01L 27/0922 (2013.01); H01L 29/0649 (2013.01);
Abstract

A semiconductor structure includes a semiconductor substrate, a plurality of transistors and an electrically insulating layer provided between the substrate and the plurality of transistors, and a trench isolation structure including a portion between a first and a second island of the semiconductor structure and extending into the substrate to a first depth. The substrate includes a bottom region having a first type of doping and extending at least to a second depth greater than the first depth, and a deep well region having a second type of doping and extending to a third depth greater than the first depth and smaller than the second depth. Each of the first and second islands includes a first backgate region having the first type of doping and being continuous with the bottom region and a second backgate region having the second type of doping and being continuous with the deep well region.


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