The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Nov. 03, 2014
Applicant:

SK Hynix Inc., Gyeonggi-do, KR;

Inventor:

Woo Yung Jung, Seoul, KR;

Assignee:

SK Hynix Inc., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 23/498 (2006.01); H01L 21/764 (2006.01); H01L 27/115 (2006.01);
U.S. Cl.
CPC ...
H01L 23/498 (2013.01); H01L 21/764 (2013.01); H01L 27/11519 (2013.01); H01L 27/11556 (2013.01); H01L 27/11565 (2013.01); H01L 27/11582 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device includes a stacked structure including conductive layers and insulating layers stacked alternately with each other, first semiconductor patterns passing through the stacked structure and arranged in a first direction, second semiconductor patterns passing through the stacked structure and arranged in the first direction, wherein the second semiconductor patterns are adjacent to the first semiconductor patterns in a second direction crossing the first direction, air gaps located between the first semiconductor patterns and the second semiconductor patterns and extending in the first direction, and at least one blocking pattern passing through the stacked structure and filling portions of the air gaps.


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