The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
May. 29, 2014
Applicant:
Canon Anelva Corporation, Kawasaki-shi, JP;
Inventor:
Yasushi Yasumatsu, Inagi, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); H01J 37/09 (2006.01); C23C 14/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); C23C 14/3407 (2013.01); H01J 37/32651 (2013.01); H01J 37/3411 (2013.01); H01J 37/3447 (2013.01);
Abstract
A processing apparatus for processing a substrate in a vacuum processing space in a chamber includes a shield arranged in the chamber, and a holding portion configured to hold the shield by a magnetic force. The holding portion has a holding surface on which a first magnet is arranged. The shield includes a second magnet configured to generate an attraction force with respect to the first magnet, and a receiving portion configured to receive a tool configured to move the shield with respect to the holding portion.