The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9582617 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 28, 2017

Filed:

Dec. 21, 2012
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Inventor:

Hironobu Taoka, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06G 7/48 (2006.01); G06F 17/50 (2006.01); G03F 7/20 (2006.01); G03F 1/70 (2012.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G03F 7/705 (2013.01); G03F 7/70441 (2013.01); G03F 7/70466 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01);
Abstract

A simulation device and simulation program are provided that can be suitably applied to a manufacturing process including a plurality of processing steps. The simulation device is provided for simulating the manufacturing process including a first processing step using a first mask, and a second processing step using a second mask. The simulation device includes first obtaining means for obtaining a first intensity distribution generated over a substrate of interest for processing by the first mask, second obtaining means for obtaining a second intensity distribution generated over the substrate by the second mask, and revising means for revising an intensity of a region in the first intensity distribution to be processed by the second mask, to a value regarded as a region not to be processed, based on the second intensity distribution.


Find Patent Forward Citations

Taoka, Hironobu. (2017). Simulation device and simulation program for simulating process using first and second masks (U.S. Patent No. 9582617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9582617

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