The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Jun. 24, 2015
Applicant:
Advantech Global, Ltd, Tortola, VG;
Inventor:
Brian Arthur Bucci, Pittsburgh, PA (US);
Assignee:
ADVANTECH GLOBAL, LTD, Tortola, VG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C23C 16/04 (2006.01); C23C 14/04 (2006.01); B05B 15/04 (2006.01); H01J 29/07 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01); C23C 14/042 (2013.01); B05B 15/045 (2013.01); B05B 15/0456 (2013.01); B05B 15/0481 (2013.01); C23C 14/04 (2013.01); H01J 29/073 (2013.01); H01J 2229/07 (2013.01); H01J 2229/0705 (2013.01); H01J 2229/0711 (2013.01); H01J 2229/0716 (2013.01); H01J 2229/0722 (2013.01); H01J 2229/0727 (2013.01); Y10T 29/49867 (2015.01); Y10T 29/53957 (2015.01); Y10T 29/53961 (2015.01);
Abstract
In a system and method of shadow mask tensioning, an object having second set of alignment features is positioned on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment. Tension is then applied to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features. The alignment features of the shadow mask can include at least one deposition aperture of the shadow mask.