The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Jul. 24, 2014
Applicant:
Nikon Corporation, Tokyo, JP;
Inventor:
Yoshitomo Nagahashi, Takasaki, JP;
Assignee:
NIKON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract
An exposure apparatus exposes a substrate via a projection optical system and liquid. The exposure apparatus includes a first pipe section that flows liquid supplied from a liquid supplying device, and a second pipe section that is disposed at an outside of the first pipe section so as to surround the first pipe section and flows liquid supplied from the liquid supplying device.
Nagahashi, Yoshitomo. (2017). Exposure apparatus, exposure method, method for manufacturing device (U.S. Patent No. 9581913). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9581913
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile