The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9580809 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 28, 2017

Filed:

Jan. 14, 2015
Applicant:

National Institute of Standards and Technology, Gaithersburg, MD (US);

Inventor:

Owen Hildreth, Pacific Grove, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 29/06 (2006.01); C23C 18/16 (2006.01); C23C 18/18 (2006.01); C23C 18/31 (2006.01); H01L 21/285 (2006.01); H01Q 17/00 (2006.01); C25F 3/12 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1608 (2013.01); C23C 18/1879 (2013.01); C23C 18/31 (2013.01); C25F 3/12 (2013.01); H01L 21/28506 (2013.01); H01L 21/306 (2013.01); H01Q 17/00 (2013.01);
Abstract

An article includes a substrate; and a coating disposed on the substrate that includes a microporous layer; a gradient in a density of a volume of the microporous layer, and a plurality of dendritic veins that are anisotropically disposed in the coating. A process for forming a coating includes disposing an activating catalyst on a substrate; introducing an activatable etchant; introducing an etchant oxidizer, performing an oxidation-reduction reaction between the substrate, the activatable etchant, and the etchant oxidizer in a presence of the activating catalyst, the oxidation-reduction reaction occurring in a liquid medium including the activatable etchant; and the etchant oxidizer, forming an etchant product comprising atoms from the substrate; removing a portion of the etchant product from the substrate; and forming a dendritic vein in the substrate to form the coating, the dendritic vein being anisotropically disposed in the coating.


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Hildreth, Owen. (2017). Article with gradient property and processes for selective etching (U.S. Patent No. 9580809). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9580809

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