The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Aug. 29, 2014
Oxea Gmbh, Oberhausen, DE;
Jens Kubitschke, Essen, DE;
Thorsten Kreickmann, Essen, DE;
Jörg Arnold, Dinslaken, DE;
Matthias Kramer, Bottrop, DE;
Heinz Strutz, Moers, DE;
OXEA GMBH, Oberhausen, DE;
Abstract
A batchwise process for aftertreatment of polyol esters prepared by reacting polyols of the general formula (II)H—(—O—[—CRR—]—)—OH  (II)in which Rand Rare each independently hydrogen, an alkyl radical having 1 to 5 carbon atoms, preferably methyl, ethyl or propyl, or a hydroxyalkyl radical having 1 to 5 carbon atoms, preferably the hydroxymethyl radical, m is an integer from 1 to 10, preferably 1 to 8 and especially 1, 2, 3 or 4, o is an integer from 2 to 15, preferably 2 to 8 and especially 2, 3, 4 or 5, with excess linear or branched aliphatic monocarboxylic acids having 3 to 20 carbon atoms and having a lower boiling point than the polyols used. The process is carried out in the presence of a Lewis acid and in the presence of an adsorbent, while removing the water formed, characterized in that the excess monocarboxylic acid is removed by distillation and water is added to the crude ester obtained at a temperature below the boiling point of water at the particular pressure and the crude ester with added water is aftertreated with avoidance of basic compounds, and the sparingly soluble conversion products and the adsorbent present in the esterification reaction are filtered off.