The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Nov. 02, 2014
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Masaki Fujikane, Osaka, JP;

Mari Onodera, Osaka, JP;

Shin-Ichi Imai, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/44 (2006.01); F02M 37/22 (2006.01); C07C 1/00 (2006.01); C02F 1/46 (2006.01); C02F 1/461 (2006.01); C02F 1/467 (2006.01);
U.S. Cl.
CPC ...
C02F 1/4608 (2013.01); C02F 1/467 (2013.01); C02F 1/46114 (2013.01); C02F 2001/46138 (2013.01); C02F 2201/4611 (2013.01); C02F 2201/4619 (2013.01); C02F 2201/46175 (2013.01); C02F 2301/043 (2013.01); C02F 2303/04 (2013.01);
Abstract

A liquid treatment apparatus according to the present disclosure includes a dielectric tube that defines a channel through which water to be treated flows, the channel being split upstream of the dielectric tube into a first channel and a second channel, the first channel and the second channel being merged with each other downstream of the dielectric tube, a first electrode at least partially disposed within the first channel, a second electrode at least partially disposed within the first channel, a first gas-supply unit that supplies gas to form a gas bubble into water to be treated that flows through the first channel, and a first power-supply that applies a voltage between the first electrode and the second electrode.


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