The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Feb. 26, 2015
Applicants:

Aaron Joseph Roy, Albuquerque, NM (US);

Timothy L Ward, Albuquerque, NM (US);

Alexey Serov, Albuquerque, NM (US);

Plamen B Atanassov, Santa Fe, NM (US);

Inventors:

Aaron Joseph Roy, Albuquerque, NM (US);

Timothy L Ward, Albuquerque, NM (US);

Alexey Serov, Albuquerque, NM (US);

Plamen B Atanassov, Santa Fe, NM (US);

Assignee:

STC.UNM, Albuquerque, NM (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 23/28 (2006.01); B01J 23/06 (2006.01); B01J 27/24 (2006.01); B01J 27/22 (2006.01); H01M 4/92 (2006.01); B01J 35/10 (2006.01); B01J 37/16 (2006.01); B01J 37/08 (2006.01); B01J 37/00 (2006.01); H01M 4/88 (2006.01);
U.S. Cl.
CPC ...
B01J 27/24 (2013.01); B01J 27/22 (2013.01); B01J 35/1014 (2013.01); B01J 37/0018 (2013.01); B01J 37/088 (2013.01); B01J 37/16 (2013.01); H01M 4/885 (2013.01); H01M 4/921 (2013.01); H01M 4/925 (2013.01);
Abstract

Novel materials having high surface area rendering them suitable for a variety of applications including, but not limited to: catalysts for methane reforming; ammonia synthesis; alcohol synthesis from syngas; hydrodesulfurization; electrocatalysis for hydrogen evolution reaction; and as corrosion-resistant supports for platinum in PEM fuel cells. In general the method comprises the formation of a high-surface area refractory metal-based material using a novel synthesis pathway that avoids the production of intermediate oxide. The method may include the in situ formation of a sacrificial support that can be removed using non-aggressive means, such as, for example, chemical etching with a mild acid or by altering reaction conditions.


Find Patent Forward Citations

Loading…