The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Sep. 02, 2008
Applicants:

An-thung Cho, Hsinchu, TW;

Chih-wei Chao, Hsinchu, TW;

Chia-tien Peng, Hsinchu, TW;

Kun-chih Lin, Hsinchu, TW;

Inventors:

An-Thung Cho, Hsinchu, TW;

Chih-Wei Chao, Hsinchu, TW;

Chia-Tien Peng, Hsinchu, TW;

Kun-Chih Lin, Hsinchu, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/04 (2014.01); H01L 31/0352 (2006.01); H01L 21/28 (2006.01); H01L 27/12 (2006.01); H01L 31/06 (2012.01); H01L 31/10 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1804 (2013.01); H01L 31/0352 (2013.01); H01L 21/28273 (2013.01); H01L 27/12 (2013.01); H01L 27/1214 (2013.01); H01L 31/06 (2013.01); H01L 31/10 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

One aspect of the present invention relates to a photovoltaic cell. In one embodiment, the photovoltaic cell includes a first conductive layer, an N-doped semiconductor layer formed on the first conductive layer, a first silicon layer formed on the N-doped semiconductor layer, a nanocrystalline silicon (nc-Si) layer formed on a first silicon layer, a second silicon layer formed on the nc-Si layer, a P-doped semiconductor layer on the second silicon layer, and a second conductive layer formed on the P-doped semiconductor layer, where one of the first silicon layer and the second silicon layer is formed of amorphous silicon, and the other of the first silicon layer and the second silicon layer formed of polycrystalline silicon.


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