The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

May. 06, 2014
Applicant:

Sunpower Corporation, San Jose, CA (US);

Inventors:

Hsin-Chiao Luan, Palo Alto, CA (US);

Denis De Ceuster, Woodside, CA (US);

Assignee:

SunPower Corporation, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01); H01L 31/0216 (2014.01); H01L 31/0236 (2006.01); H01L 31/068 (2012.01); H01L 31/0224 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02168 (2013.01); H01L 31/02167 (2013.01); H01L 31/02363 (2013.01); H01L 31/02366 (2013.01); H01L 31/022441 (2013.01); H01L 31/0682 (2013.01); Y02E 10/50 (2013.01); Y02E 10/546 (2013.01); Y02E 10/547 (2013.01);
Abstract

A multilayer anti-reflection structure for a backside contact solar cell. The anti-reflection structure may be formed on a front side of the backside contact solar cell. The anti-reflection structure may include a passivation level, a high optical absorption layer over the passivation level, and a low optical absorption layer over the high optical absorption layer. The passivation level may include silicon dioxide thermally grown on a textured surface of the solar cell substrate, which may be an N-type silicon substrate. The high optical absorption layer may be configured to block at least 10% of UV radiation coming into the substrate. The high optical absorption layer may comprise high-k silicon nitride and the low optical absorption layer may comprise low-k silicon nitride.


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