The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Sep. 22, 2014
Applicants:

Mark T. Finch, Redmond, WA (US);

Matthew B. Maclaurin, Woodinville, WA (US);

Stephen B. Coy, Redmond, WA (US);

Eric S. Anderson, Seattle, WA (US);

Lili Cheng, Bellevue, WA (US);

Inventors:

Mark T. Finch, Redmond, WA (US);

Matthew B. MacLaurin, Woodinville, WA (US);

Stephen B. Coy, Redmond, WA (US);

Eric S. Anderson, Seattle, WA (US);

Lili Cheng, Bellevue, WA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G09G 5/00 (2006.01); G06T 17/10 (2006.01); G06T 17/05 (2011.01); G06T 19/20 (2011.01); G06F 3/0481 (2013.01); G06F 3/0484 (2013.01);
U.S. Cl.
CPC ...
G06T 17/10 (2013.01); G06F 3/04815 (2013.01); G06F 3/04842 (2013.01); G06F 3/04845 (2013.01); G06T 17/05 (2013.01); G06T 19/20 (2013.01); G06T 2219/2004 (2013.01); G06T 2219/2008 (2013.01); G06T 2219/2021 (2013.01);
Abstract

Described is a virtual environment built by drawing stacks of three-dimensional objects (e.g., discrete blocks) as manipulated by a user. A user manipulates one or more objects, resulting in stack heights being changed, e.g., by adding, removing or moving objects to/from stacks. The stack heights are maintained as sample points, e.g., each point indexed by its associated horizontal location. A graphics processor expands height-related information into visible objects or stacks of objects by computing the vertices for each stack to draw that stack's top surface, front surface and/or side surface based upon the height-related information for that stack. Height information for neighboring stacks may be associated with the sample point, whereby a stack is only drawn to where it is occluded by a neighboring stack, that is, by computing the lower vertices for a surface according to the height of a neighboring stack where appropriate.


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