The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Oct. 22, 2014
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;

Inventors:

Jaedon Lee, Yongin-si, KR;

Jinwoo Kim, Seoul, KR;

Youngsam Shin, Hwaseong-si, KR;

Minwoo Lee, Gwangju, KR;

Wonjong Lee, Seoul, KR;

Tackdon Han, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/06 (2011.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01);
Abstract

Provided are an apparatus and method for generating an acceleration structure in a ray tracing system. The method of generating an acceleration structure includes splitting, at an acceleration structure generator, a space comprising a three-dimensional (3D) object into a plurality of sub spaces, calculating costs for traversing the plurality of sub spaces based on occlusion information of primitives in the plurality of sub spaces, selecting the plurality of sub spaces that minimize the costs for traversing, and generating an acceleration structure based on setting the selected plurality of sub spaces as nodes.


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