The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Nov. 04, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Hung Khei Huang, Irvine, CA (US);
Bradley Scott Denney, Irvine, CA (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
SIFT features are selected from an input image. A SIFT procedure is applied to the input image to obtain candidate keypoints. For each candidate keypoint, there is calculation of a first Laplacian value (L) for pixels in an upper Scale Space and a second Laplacian value (L) for pixels in a lower Scale Space, based on the position of the candidate keypoint. A candidate keypoint is discarded if a Laplacian value Lof the keypoint position is less than or equal to either of Lor L. In the case that the candidate keypoint is not discarded, the candidate keypoint's Laplacian strength (L) is calculated, based on a relative change in Laplacian value from Lto Land from Lto L. One or more candidate keypoints are selected as SIFT features based on the corresponding Laplacian strength.