The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Aug. 16, 2013
Applicant:
Isis Innovation Limited, Oxfordshire, GB;
Inventors:
Martin Booth, Oxfordshire, GB;
Daniel Burke, Oxfordshire, GB;
Joerg Bewersdorf, New Haven, CT (US);
Travis J. Gould, New Haven, CT (US);
Assignee:
ISIS Innovation Ltd, Oxfordshire, GB;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/58 (2006.01); G02B 21/00 (2006.01); G02B 26/06 (2006.01); G01N 21/63 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0072 (2013.01); G01N 21/636 (2013.01); G01N 21/6456 (2013.01); G01N 21/6458 (2013.01); G02B 21/0076 (2013.01); G02B 26/06 (2013.01);
Abstract
Aberrations in stimulated emission depletion microscopy are corrected using an adaptive optics approach using a metric which combines both image sharpness and brightness. Light modulators () are used to perform aberration correction in one or more of the depletion path (), the excitation path (), or the emission path from sample to detector.