The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Mar. 23, 2015
L & P Property Management Company, South Gate, CA (US);
Joshua A. Carrier, Carl Junction, MO (US);
John Tony Garrett, Carthage, MO (US);
Jefferson W. Myers, Joplin, MO (US);
Terrance L. Myers, Joplin, MO (US);
Jason B. Turner, Joplin, MO (US);
L&P Property Management Company, South Gate, CA (US);
Abstract
A method of dynamically changing stitch density of a quilting pattern during sewing is provided. Embodiments of the invention include dynamically changing stitch density along an axis of a sewing pattern based on identifying sewing pattern elements, which may include line segments and arc segments. Each of the line segments and/or arc segments is assigned a dynamically adjusted stitch density based on analysis of each pattern element and/or adjacent element. An adjusted stitch density is assigned to portions of pattern elements that satisfy a threshold measurement for sewing with an adjusted stitch density. In embodiments, a standard stitch density, intermediate stitch density, or an altered stitch density is automatically assigned to each portion of a sewing pattern based on an analysis of threshold length of an element, a threshold angle of a portion of the element with respect to the axis, and/or the stitch density assigned to an adjacent element.