The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Dec. 18, 2013
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jung Su Han, Daejeon, KR;

Seung Uk Yeu, Daejeon, KR;

Seung Hun Yang, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 9/04 (2006.01); B29C 41/00 (2006.01); B29C 41/14 (2006.01); B29K 9/06 (2006.01);
U.S. Cl.
CPC ...
C08L 9/04 (2013.01); B29C 41/003 (2013.01); B29C 41/14 (2013.01); B29K 2009/06 (2013.01);
Abstract

Disclosed are a carboxylic acid modified-nitrile based copolymer composition and a dip-formed article produced therefrom. More specifically, disclosed are a copolymer composition comprising a carboxylic acid modified-nitrile copolymer latex having a glass transition temperature of a −60 to −10° C. and a carboxylic acid modified-styrene copolymer latex having a glass transition temperature of 30 to 110° C., and a dip-formed article produced therefrom. Provided are advantageously a carboxylic acid modified-nitrile based copolymer composition enabling production of dip-formed articles having physical properties comparable to conventional articles and greatly improved wearing sensation and doping property, and a dip-formed article produced therefrom.


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