The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Sep. 25, 2015
Applicant:
Gabae Technologies, Llc, Dallas, TX (US);
Inventors:
Evan Koslow, Dallas, TX (US);
Jocelyn Tindale, Guelph, CA;
Ryan Gerakopulos, Waterloo, CA;
Chitral Angammana, Guelph, CA;
Tatiana Lazareva, Waterloo, CA;
Assignee:
Gabae Technologies, LLC, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/22 (2006.01); C08J 3/12 (2006.01); D01D 5/00 (2006.01); C08L 23/12 (2006.01); C08K 5/06 (2006.01); C03B 19/10 (2006.01); C03B 37/005 (2006.01); D01D 5/098 (2006.01); D01D 5/18 (2006.01); D01F 1/02 (2006.01); B05B 3/10 (2006.01); B05B 5/08 (2006.01); C08J 3/20 (2006.01); C08K 5/14 (2006.01); C08J 3/02 (2006.01); D01D 5/26 (2006.01); D01F 6/06 (2006.01); B05B 3/00 (2006.01); B05B 7/00 (2006.01);
U.S. Cl.
CPC ...
C08J 3/12 (2013.01); B05B 3/1014 (2013.01); B05B 5/08 (2013.01); C03B 19/1015 (2013.01); C03B 37/005 (2013.01); C08J 3/02 (2013.01); C08J 3/122 (2013.01); C08J 3/201 (2013.01); C08K 3/22 (2013.01); C08K 5/06 (2013.01); C08K 5/14 (2013.01); C08L 23/12 (2013.01); D01D 5/0007 (2013.01); D01D 5/0015 (2013.01); D01D 5/0023 (2013.01); D01D 5/0069 (2013.01); D01D 5/0985 (2013.01); D01D 5/18 (2013.01); D01D 5/26 (2013.01); D01F 1/02 (2013.01); D01F 6/06 (2013.01); B05B 3/001 (2013.01); B05B 7/00 (2013.01); C08J 2323/12 (2013.01); C08K 2003/2241 (2013.01); C08K 2201/001 (2013.01);
Abstract
A method of forming particles that includes performing a strong force attenuation of a mixture to form pre-particles. The mixture including a base compound and a dielectric additive having an elevated dielectric constant dispersed therein. The pre-particles are then dielectrically spun in an electrostatic field to further attenuate the pre-particles and form the particles.