The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Feb. 23, 2010
Applicant:

Grant Mcguffey, Springfield, TN (US);

Inventor:

Grant McGuffey, Springfield, TN (US);

Assignee:

Illinois Tool Works, Inc., Glenview, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/10 (2006.01); B05C 5/02 (2006.01); B05D 1/34 (2006.01); B05D 5/10 (2006.01);
U.S. Cl.
CPC ...
B05C 11/1036 (2013.01); B05C 5/025 (2013.01); B05C 11/1042 (2013.01); B05D 1/34 (2013.01); B05D 5/10 (2013.01);
Abstract

A method of making an article having a substrate and two materials applied thereto includes providing a metered fluid dispensing system having first and second supply sources for supplying first and second fluids, respectively, an output device having at least one dispensing nozzle, and at least two pumps for pumping the first and second fluids from their respective supply sources to the at least one dispensing nozzle, the pumps being in close proximity to the dispensing nozzle. The dispensing system is configured to selectively control the passage of the first and second fluids from each one of the at least two pumps to the at least one dispensing nozzle. The substrate is conveyed past the fluid dispensing system in a machine direction and the first, or second, or first and second fluids are applied to the substrate in a plurality of segments, each segment having a volume per unit length and applied in a length in the machine direction to define a pattern, and in which wherein the pattern includes at least some areas in which the first or second fluid is present without the other fluid.


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