The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Dec. 31, 2013
Applicant:
SK Hynix Inc., Icheon-Si, KR;
Inventors:
Jae-Heon Kim, Icheon-Si, KR;
Sung-Koo Lee, Icheon-Si, KR;
Assignee:
SK hynix Inc., Icheon-Si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); H01L 45/00 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 43/08 (2006.01); H01L 27/22 (2006.01); H01L 27/24 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 45/16 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); H01L 21/76816 (2013.01); H01L 27/222 (2013.01); H01L 27/2463 (2013.01); H01L 43/08 (2013.01); H01L 45/06 (2013.01); H01L 45/08 (2013.01); H01L 45/1233 (2013.01); H01L 45/1675 (2013.01);
Abstract
Devices and method based on disclosed technology include, among others, a method for capable of providing asymmetrical arrangement of hole patterns while improving non-uniformity of an electronic device. Specifically, a method for fabricating hole patterns in one implementation includes forming a mask pattern which is defined with hole patterns of an asymmetrical arrangement with different longitudinal and transverse intervals, over a layer to be etched; and etching the layer to be etched, using the mask pattern as an etch barrier.