The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Jul. 17, 2014
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Daniel Krebs, Zurich, CH;
Gabriele Raino, Zurich, CH;
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1293 (2013.01); H01L 27/2463 (2013.01); H01L 45/06 (2013.01); Y10S 977/774 (2013.01);
Abstract
A semiconductor structure is described containing a deflector between a first nanoscale device and a second nanoscale device. The deflector is designed to deflect near-field radiation from emanating from the first nanoscale device to the second nanoscale device. In some embodiments, this may be accomplished using at least one nanoscale element located between the first and second nanoscale device, where the nanoscale element is tuned to the proper plasmon-polariton frequency to deflect the near field radiation.