The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Aug. 27, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Provided is a method of manufacturing an imaging apparatus. The imaging apparatus is formed on a substrate and includes a pixel region and a peripheral circuit region that is arranged on a periphery of the pixel region. The method includes: forming an insulating layer in the pixel region and the peripheral circuit region; etching the insulating layer formed in the pixel region in a state in which the peripheral circuit region is protected; planarizing a surface of the insulating layer; and forming a waveguide in the pixel region. After the forming an insulating layer and before the etching the insulating layer, an average value of heights of a top surface of the insulating layer in the pixel region is larger than an average value of heights of a top surface of the insulating layer in the peripheral circuit region.