The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Sep. 03, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Tadashi Arai, Saitama, JP;
Yuichi Gyoda, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A mask data generating method for generating data of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask. The method includes the steps of obtaining data for a pattern including a plurality of pattern elements, determining formulation of a disposition limitation condition for the pattern elements, analyzing the distance between the pattern elements, determining formulation of the distance limitation condition, and applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern.