The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Aug. 12, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Takahiro Nakayama, Albany, NY (US);
Akira Miyake, Nasukarasuyama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an exposure apparatus for exposing a shot on a substrate to first pulsed light, the apparatus including an optical element for guiding the first pulsed light to the substrate, an irradiation device configured to irradiate the optical element with second pulsed light having an infrared wavelength which the first pulsed light has less than the second pulsed light has, and a controller configured to control the irradiation device in a process of exposing the shot to the first pulsed light plural times, such that the irradiation device irradiates the optical element with the second pulsed light during at least one period of non-irradiation periods in which the shot is not irradiated with the first pulsed light.