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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9568824 B1

PDFFull Text
Date of Patent:
Feb. 14, 2017

Filed:

Jul. 28, 2011

Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith

Applicants:

Toshiya Takahashi, Shizuoka, JP;

Hideaki Tsubaki, Shizuoka, JP;

Hiroshi Tamaoki, Shizuoka, JP;

Hidenori Takahashi, Shizuoka, JP;

Inventors:

Toshiya Takahashi, Shizuoka, JP;

Hideaki Tsubaki, Shizuoka, JP;

Hiroshi Tamaoki, Shizuoka, JP;

Hidenori Takahashi, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0758 (2013.01); G03F 7/20 (2013.01); G03F 7/2037 (2013.01); G03F 7/2039 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01);
Abstract

Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.

Find Patent Forward Citations

Takahashi, Toshiya. (2017). Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith (U.S. Patent No. 9568824). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9568824

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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