The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Sep. 23, 2015
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Stefan Ochs, Gelnhausen, DE;
Klaus Becker, Hanau, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO—SiOsoot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO—SiOsoot body to form a fluorine-doped TiO—SiOsoot body, (c) treating the fluorine-doped TiO—SiOsoot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3and Ti.