The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
May. 23, 2014
Applicants:
Mitra Lenore Taheri, Philadelphia, PA (US);
Asher Calvin Leff, Philadelphia, PA (US);
Inventors:
Mitra Lenore Taheri, Philadelphia, PA (US);
Asher Calvin Leff, Philadelphia, PA (US);
Assignee:
Drexel University, Philadelphia, PA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2006.01); G01N 23/02 (2006.01); G01L 1/25 (2006.01); G01N 23/04 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20058 (2013.01); G01L 1/25 (2013.01); G01N 23/02 (2013.01); G01N 23/04 (2013.01); G01N 23/20 (2013.01); H01J 37/26 (2013.01); G01N 2223/03 (2013.01); G01N 2223/0565 (2013.01); G01N 2223/0566 (2013.01); G01N 2223/418 (2013.01); G01N 2223/607 (2013.01);
Abstract
A sample material is scanned with a transmission electron microscope (TEM) over multiple steps having a predetermined size at a predetermined angle. Each scan at a predetermined step and angle is compared to a template, wherein the template is generated from parameters of the material and the scanning. The data is then analyzed using local mis-orientation mapping and/or Nye's tensor analysis to provide information about local strain states.