The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Oct. 22, 2012
Zhejiang University, Hangzhou, Zhejiang Province, CN;
Cuifang Kuang, Hangzhou, CN;
Shuai Li, Hangzhou, CN;
Xiang Hao, Hangzhou, CN;
Zhaotai Gu, Hangzhou, CN;
Xu Liu, Hangzhou, CN;
ZHEJIANG UNIVERSITY, Hangzhou, CN;
Abstract
This invention discloses a super-resolution microscopy method and device, of which the method comprises the following steps: converting laser beam into linearly polarized light after collimation; linearly polarized light is deflected and phase modulated by a spatial light modulator; the deflected beam is focused, collimated and then converted into circularly polarized light for projection on the sample to collect signal light from various scanning points on the sample, and obtaining the first signal light intensity; switching over modulation function to project linearly polarized light modulated by the second phase modulation on the sample to collect signal light from various scanning points on the sample, and obtaining the second signal light intensity; calculating valid signal light intensity to obtain the super-resolution image. This device features in a simple structure and easy operation, which can obtain a super-resolution beyond diffraction limit at a lower luminous power; it is quick in image formation with the frame frequency over 15 frames when the number of scanning points in each image is 512×512.