The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2017

Filed:

Jun. 01, 2012
Applicants:

Sergey D. Lopatin, Morgan Hill, CA (US);

Dmitri A. Brevnov, Santa Clara, CA (US);

Robert Z. Bachrach, Burlingame, CA (US);

Inventors:

Sergey D. Lopatin, Morgan Hill, CA (US);

Dmitri A. Brevnov, Santa Clara, CA (US);

Robert Z. Bachrach, Burlingame, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/64 (2006.01); C25D 3/38 (2006.01); C25D 5/10 (2006.01); C25D 5/18 (2006.01); C25D 5/48 (2006.01); C25D 17/00 (2006.01); H01M 4/04 (2006.01); H01M 4/36 (2006.01); H01M 4/38 (2006.01); H01M 4/66 (2006.01);
U.S. Cl.
CPC ...
C25D 3/38 (2013.01); C25D 5/10 (2013.01); C25D 5/18 (2013.01); C25D 5/48 (2013.01); C25D 17/00 (2013.01); H01M 4/0438 (2013.01); H01M 4/366 (2013.01); H01M 4/38 (2013.01); H01M 4/661 (2013.01);
Abstract

A method and apparatus for forming a reliable and cost efficient battery or electrochemical capacitor electrode structure that has an improved lifetime, lower production costs, and improved process performance are provided. In one embodiment a method for forming a three dimensional porous electrode for a battery or an electrochemical cell is provided. The method comprises depositing a columnar metal layer over a substrate at a first current density by a diffusion limited deposition process and depositing three dimensional metal porous dendritic structures over the columnar metal layer at a second current density greater than the first current density.


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