The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Jun. 02, 2010
Applicants:
Norikazu Nakamura, Kawasaki, JP;
Shoichi Miyahara, Kawasaki, JP;
Hiroshi Chiba, Kawasaki, JP;
Inventors:
Assignee:
FUJITSU LIMITED, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); C23C 16/50 (2006.01); C23C 14/06 (2006.01); C23C 14/32 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); H05H 1/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/50 (2013.01); C23C 14/0605 (2013.01); C23C 14/325 (2013.01); C23C 14/564 (2013.01); H01J 37/32055 (2013.01); H01J 37/32357 (2013.01); H05H 1/50 (2013.01);
Abstract
A film deposition apparatus includes: a plasma generating section configured to generate plasma between a cathode target and an anode; a film deposition chamber in which a base material is placed; and a magnetic-field filter section configured to remove a particle from the plasma by a magnetic field and to transfer the plasma to the film deposition chamber. The magnetic-field filter section includes: a first housing area to which a first voltage is applied; and a second housing area, provided downstream of the first housing area in the moving direction of the plasma, to which a second voltage is applied.