The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Oct. 20, 2014
Applicant:
Ubmaterials Inc., Yongin-Si, Gyeonggi-do, KR;
Inventor:
Seung Won Jung, Anyang-Si, KR;
Assignee:
UBMATERIALS INC., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); C09K 13/02 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C09G 1/02 (2006.01); H01L 21/321 (2006.01); C09K 3/14 (2006.01); H01L 21/304 (2006.01); C23F 3/06 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); C23F 3/06 (2013.01); H01L 21/304 (2013.01); H01L 21/3212 (2013.01);
Abstract
A polishing slurry for tungsten and a substrate polishing method are disclosed. The polishing slurry includes an abrasive for performing polishing and having positive zeta potential, and a potential modulator for promoting the oxidation of the tungsten and for controlling the zeta potential of the abrasive.